集成的低损耗,高隔离和宽带磁光隔离器与TE模式输入
Li Liu1, Jia Zhao1, Chen Zhang1
1School of Information Science and Engineering, Shandong University, Qingdao 266237, China.
Micromachines
|March 27, 2025
概括
我们设计了一种高性能TE模式光学隔离器,使用AlGaAs-on-insulator用于集成光子学. 该设备提供低损耗和高隔离,对于非线性光学应用至关重要.
科学领域:
- 光子学和集成光学技术.
- 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-insulator) 材料科学 (AlGaAs-on-on-insulator) 材料科学
- 非线性光学是非线性光学.
背景情况:
- 光学隔离器对于防止光子集成电路 (PIC) 中反射是必不可少的.
- 现有的隔离器通常在性能,带宽或集成兼容性方面面临限制.
- 高性能隔离器对于推进非线性光学系统至关重要.
研究的目的:
- 为TE模式光学隔离器提出和分析一个优化的设计.
- 为了利用AlGaAs-on-insulator平台提高设备的性能.
- 确保适用于高效和稳定的非线性光学应用.
主要方法:
- 一个光学隔离器的设计,使用非反复相位移 (NRPS) 和反复相位移 (RPS) 波导.
- 集成多模式干扰 (MMI) 合器,以实现高效的光管理.
- 数字模拟用于评估性能指标,如隔离,带宽和损失.
- 对磁光 (MO) 波导的限制因素和制造公差的分析.
主要成果:
- 在波长为1550 nm的30 dB隔离下,实现了91 nm的广泛操作带宽.
- 证明了1.47dB的低总插入损失.
- 计算出了2.76rad/dB的优点 (FoM) 值.
- 对实际设备可靠性的研究制造公差.
结论:
- 拟议的AlGaAs-on-insulatorTE模式光学隔离器设计提供了高性能.
- 该设备非常适合集成到PIC和先进的非线性光学系统.
- 这项工作为未来光子应用开发稳定高效的光学隔离器提供了途径.
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