基于亚-5nm单层KMgX (X = P,As,Sb) 的同质CMOS设备,用于高性能应用

Yandong Guo1,2, Yuting Guo1, Zhipeng Huan1

  • 1College of Electronic and Optical Engineering, Nanjing University of Posts and Telecommunications, Nanjing 210046, China. yandongguo@njupt.edu.cn.

Nanoscale
|March 27, 2025
PubMed
概括

单层KMgX材料对未来的电子产品充满希望,在超越的晶体管中提供对称性能. 这些材料满足5nm以下设备的严格要求,为先进的CMOS电子铺平了道路.