在多层 PdSe2 场效应晶体管中进行界面热传输和能量消耗
Jiaqiu Xie1, Zehao Yu1, Yuanchen Sun1
1Phonon Engineering Research Center of Jiangsu Province, Ministry of Education Key Laboratory of NSLSCS, Center for Quantum Transport and Thermal Energy Science, Institute of Physics Frontiers and Interdisciplinary Sciences, School of Physics and Technology, Nanjing Normal University, Nanjing, 210023, China.
本研究探讨了二化 (PdSe2) 场效应晶体管 (FET) 中的能量消耗. PdSe2 FET表现出高电流密度和低热边界导电量,这表明通过界面优化可以提高性能.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术纳米技术
背景情况:
- 2D电子电路的小型化增加了功率密度,导致热量问题.
- 在二维半导体场效应晶体管 (FET) 中的热分解挑战了最佳性能.
- 了解能量消耗对于先进的电子设备至关重要.
研究的目的:
- 首次研究多层二化 (PdSe2) 场效应晶体管 (FET) 中的能量消耗.
- 分析PdSe2 FETs的高场分解行为和热特性.
- 为设计高性能PdSe2电子和光电子设备提供见解.
主要方法:
- 在SiO2/Si基板上制造和表征多层PdSe2FET.
- 高场电力故障测量以确定电流密度极限.
- 拉曼温度计用于测量PdSe2/SiO2接口的热边电导率 (TBC).
主要成果:
- PdSe2 FET的最大电流密度约为2.74 MA cm-2,相当于黑FET,是MoS2 FET的五倍.
- 在PdSe2/SiO2接口的热边界导电量 (TBC) 测定为大约12-13 MW m-2 K-1.1.
- 与其他固体-固体接口相比,这种TBC值相对较低.
结论:
- PdSe2 FET表现出有希望的高电流承载能力.
- 在PdSe2/SiO2接口的低TBC为性能提升提供了机会.
- 优化热接口是释放基于PdSe2设备的全部潜力的关键.
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