通过室温大气压原子层沉积的稳定分散和长时间溶解的水友制药物,通过室温大气压原子层沉积实现了稳定的分散和长时间溶解
Viet Phuong Cao1, Kim-Hue Thi Dinh1, Truong Duc Dinh1
1Faculty of Materials Science and Engineering, Phenikaa University, Yen Nghia, Ha Dong District, Hanoi 12116, Vietnam. hao.buivan@phenikaa-uni.edu.vn.
Chemical communications (Cambridge, England)
|April 1, 2025
概括
在二二氧化 (SiO2) 薄膜的原子层沉积在二二粉上,提高了药物的稳定性. SiO2涂层延长溶解,并通过防止沉积,创造稳定的水性分散.
科学领域:
- 材料科学 材料科学 材料科学
- 制药科学 制药科学
- 化学工程是化学工程的重要组成部分.
背景情况:
- 狄克洛菲纳克是一种广泛使用的非类固醇抗炎药物 (NSAID).
- 提高药物粉末的溶解概况和分散稳定性对于有效的药物输送至关重要.
- 药物颗粒的表面修饰可以增强它们的物理化学性质.
研究的目的:
- 为了研究原子层沉积 (ALD) 的应用,用于涂层制药粉末.
- 评估二氧化 (SiO2) 涂层对二甲溶解特性的影响.
- 评估SiO2涂层对水性介质中二甲分散稳定性的影响.
主要方法:
- SiO2薄膜的原子层沉积 (ALD) 在水友性二二粉上.
- 用表面分析技术对涂层粉末进行表征.
- 溶解测试用于测量药物释放率.
- 测量泽塔电位以评估表面电荷和分散稳定性.
主要成果:
- 在环境条件下,成功地将均的SiO2薄膜沉积在二甲粉上.
- SiO2涂层显著延长了二甲的溶解时间.
- 观察到涂层颗粒的增强表面泽塔潜力,表明表面电荷增加.
- 涂层的二甲在水中表现出高度稳定的分散,防止沉积.
结论:
- ALD是一种可行的技术,用于修改药品粉末的表面.
- 通过ALD进行SiO2涂层可以调节溶解行为并改善二二的分散稳定性.
- 使用SiO2的表面功能化为开发具有增强性质的先进制药配方提供了一个有前途的战略.
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