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单立体化电光调制器,通过光学辅助抛光启用

Christian Lafforgue¹, Boris Zabelich^1,2, Camille-Sophie Brès¹

¹Ecole Polytechnique Fédérale de Lausanne, Photonic Systems Laboratory (PHOSL), CH-1015 Lausanne, Switzerland.

Communications physics

|April 11, 2025

概括

化通过光学辅助抛光显示电光学 (EO) 调制,绕过高温. 这使得集成光信号处理的紧型芯片内EO调制器成为可能.

科学领域:

光子学和材料科学材料科学
集成光学集成光学集成光学

背景情况:

化是芯片集成光子学的一个有前途的材料.
在化中实现线性电光 (EO) 效果是具有挑战性的,因为它的内在特性.
最近的工作表明,在高电场下的电荷载体移位可以诱导线性EO效应.

研究的目的:

开发一种低温方法,使化中的线性电光调制成为可能.
为了演示化微波振器的光学辅助抛光.
为了描述由此产生的化EO调节器的性能.

主要方法:

在室温下对化微振振振器进行光学辅助抛光.
优化光学抛光过程以诱导二次非线性.
测量有效的第二阶非线性和高速EO响应.

主要成果:

成功实施光学辅助抛光,避免高温加工.
实验实现了1.218 pm/V.的长期有效的第二阶非线性.
展示了一种具有4GHz带宽的高速EO调制器.

结论:

光学辅助抛光是一种有效的技术,可以在化中实现线性EO调制.
这种方法使得能够开发出紧的,单质的化EO调节器.
结果为先进的集成光学信号处理铺平了道路.

关键词:

集成光学集成光学非线性光学是一种非线性光学.光电子设备和组件的组件.

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