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氧化的原子层沉积作为氧化物进化反应反应的电催化剂

Jueyu Chen¹, Ruijie Dai¹, Hongwei Ma¹

¹School of Materials Science and Engineering, Key Laboratory for Polymeric Composite and Functional Materials of Ministry of Education, Sun Yat-sen University, Guangzhou 510006, China.

Nanomaterials (Basel, Switzerland)

|April 11, 2025

概括

我们开发了一种新的原子层沉积 (ALD) 方法,用于氧化 (NiO_x) 使用新型前体. 这一过程产生了高质量的NiO_x膜,其氧化演化反应 (OER) 的性能非常出色.

科学领域:

材料科学材料科学材料科学
电化学电化学电化学
化学工程是化学工程的重要组成部分.

背景情况:

原子层沉积 (ALD) 允许精确的薄膜制造.
氧化 (NiO_x) 是电催化的一个有前途的材料.
开发高效的氧化演化反应 (OER) 催化剂对于能源技术至关重要.

研究的目的:

为NiO_x引入一种新的ALD工艺,使用 (甲基cyclopentadienyl) (cyclopentadienyl) (NiCp) 和臭氧 (O_3).
描述沉积的NiO_x膜的结构和化学特性.
评估NiO_x的电催化活性,用于氧化演化反应 (OER).

主要方法:

原子层沉积 (ALD) 使用NiCp(MeCp) 前体和O₃氧化剂.
薄膜沉积在150-250°C的温度窗口中.
_x薄膜的特性 (相位,成分,生长速度) 和OER的电化学测试.

主要成果:

实现了0.39 Å/周期的一致NiO_x增长率.
在250°C下沉积的NiO_x薄膜显示出具有低碳污染的立方相.
经过回火的ALD NiO_x表现出极好的OER性能:在10 mA cm^-2和70.5 mV dec^-1的Table斜率下320 mV的超电位.

结论:

使用NiCp (MeCp) 的新型ALD过程对于沉积高质量的NiO_x膜是有效的.
由此产生的NiO_x显示出作为OER的高活性电催化剂的巨大潜力.
这种方法为制造用于能源应用的先进催化剂提供了可行的途径.

关键词:

原子层沉积的原子层沉积.纳米催化剂的纳米催化剂氧化物氧化物氧气进化反应反应氧气进化反应

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