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Updated: May 11, 2025

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

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腐蚀层对由液体制成的固态计氧化物进行表征,朝着动态建模方向

Concettina Andrello1,2,3, Loic Favergeon1, Lionel Desgranges2

  • 1Mines Saint-Etienne, Univ. Lyon, CNRS, UMR 5307 LGF, Centre SPIN, F-42023 Saint-Etienne, France.

Inorganic chemistry
|April 17, 2025
PubMed
概括

这项研究研究了在反应堆条件下二氧化与液态的相互作用. 不同的氧气水平导致了不同的腐蚀层,其中一个场景形成了新的酸阶段.

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