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Updated: May 11, 2025

Synthesis and Characterization of High c-axis ZnO Thin Film by Plasma Enhanced Chemical Vapor Deposition System and its UV Photodetector Application
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Synthesis and Characterization of High c-axis ZnO Thin Film by Plasma Enhanced Chemical Vapor Deposition System and its UV Photodetector Application

Published on: October 3, 2015

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ZnOx覆盖层仅限于ZnCr2O4旋转,用于直接将合成气转化为轻烯

Xiaohui Feng1,2, Haoran Jia2, Rongtan Li2

  • 1Department of Chemical Physics, University of Science and Technology of China, Hefei, 230022, China.

Nature communications
|April 18, 2025
PubMed
概括

该研究确定了氧化 (ZnO) 覆盖氧化 (ZnCr2O4) 上的氧化 (ZnCr2O4) 覆盖层作为将合成气转化为轻烯酸的活性位点. 这种稳定的ZnCr2O4@ZnOx结构显示出高的催化性能和稳定性.

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