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Updated: May 12, 2025

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在介电接口上植入的多电解质层的结构:介电对比,离子强度和排除体积的合效应

Mingyu Chen1, Xiaofei Xu1

  • 1State Key Laboratory of Chemical Engineering and School of Chemical Engineering, East China University of Science and Technology, Shanghai 200237, China.

The journal of physical chemistry. B
|April 23, 2025
PubMed
概括

在介电接口的移植聚电解质层 (GPEL) 显示了由介电对比度,离子强度和排除体积影响的复杂行为. 了解这些结合效应对于预测GPEL膨胀和收缩至关重要. 关键词:植入的多电解质层,介电接口,离子强度,不包括体积.

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