使用Si/SiGe/GeSn材料在直角定向的选择性埋藏的三门垂直功率MOSFET中对道移动性增强技术的研究:设计和性能分析
M Ejaz Aslam Lodhi1,2, Abdul Quaiyum Ansari2, Sajad A Loan3
1Department of Electronics and Communication Engineering, Indira Gandhi Delhi Technical University for Women, Delhi 110006, India.
Micromachines
|April 26, 2025
概括
这项研究引入了一种具有增强通道控制的新型三门垂直功率MOSFET. 新设计显著提高了电子的移动性,并减少了高速应用的启动阻力.
科学领域:
- 半导体设备物理 半导体设备物理
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
背景情况:
- (Si) MOSFET的性能由于通道中的门控制损失而下降.
- 传统的Si功率MOSFET在实现最佳性能方面存在局限性.
研究的目的:
- 介绍和研究一种新的直角导向的选择性埋藏的三门垂直功率MOSFET.
- 为了比较这个新设备的性能与传统的Si功率MOSFET.
- 评估不同通道材料 (SiGe/GeSn超过Si) 对设备性能的影响.
主要方法:
- 利用 2D Silvaco 模拟来进行设备建模和性能分析.
- 研究了使用各种通道材料的设备特性,包括SiGe和GeSn对Si.
- 与传统Si功率MOSFET相比,主要性能指标进行了比较.
主要成果:
- 通过拟议的三门设计,实现了 880 cm2/V·s 的高通道电子流动性.
- 在设备的电流,电阻和透导方面显著改进.
- 实现了0.31 mΩ·cm2的超低的特定ON电阻,提高了优点数据 (FOM1为411.61%,FOM2为98.704%).
结论:
- 新的三门垂直功率MOSFET提供了优越的性能,与传统的Si MOSFET相比.
- 该设备由于增强的参数,适用于高速和切换应用.
- 该技术显示与高流动性通道材料的兼容性,为未来的CMOS应用铺平了道路.
相关概念视频
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