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经酸修饰的Cu-Ce/HZSM-5吸附剂在聚生产过程中从回收中去除微量杂质

Zhiyuan Liu¹, Guoqiang Huang¹

¹School of Chemical Engineering and Technology, Tianjin University Tianjin 300072 PR China hgq@tju.edu.cn.

|April 30, 2025

概括

一种酸修饰的Cu-Ce/HZSM-5吸附剂有效地从回收中去除 (PH3) 杂质. 通过酸和进行优化,它显示出优越的性能和可再生性,用于聚生产.

科学领域:

材料科学材料科学材料科学
化学工程是化学工程的重要组成部分.
环境科学环境科学

背景情况:

在化学蒸汽沉积 (CVD) 中回收的用于聚生产需要高纯度.
微量 (PH3) 杂质可能会对多质量和工艺效率产生负面影响.
开发有效的吸附剂来去除PH3对于半导体制造至关重要.

研究的目的:

开发和优化一种酸修饰的Cu-Ce/HZSM-5双金属吸附剂,用于去除PH3.
调查酸处理和兴奋剂对吸附剂性能的影响.
了解吸附剂的吸附机制和失活路径.

主要方法:

合成Cu-Ce/HZSM-5双金属吸附剂.
使用不同度的酸 (HNO3) 进行酸性修饰.
与 (Ce) 在不同比例相对于铜 (Cu) 的兴奋剂.
评估PH3吸附能力和突破性能的评估.
使用X射线衍射 (XRD) 和X射线光电子谱学 (XPS) 的表征.

主要成果:

最佳吸附剂被处理为13%的HNO3和1:40的Ce:Cu比率.
达到高PH3突破吸附能力135.2毫克g-1.
在经过三次再生周期后,证明了卓越的性能.
由于Cu2(OH) 3NO3形成,增加微孔体积,增强金属氧化物分布,以及更具反应性的氧物种和酸性部位,提高了效率.
鉴定了由于食用活性物种和积累P2O5和铜化物等反应产物的吸附剂失活.

结论:

酸修饰的Cu-Ce/HZSM-5是一种高效的吸附剂,用于从回收中去除PH3.
优化的合成参数显著提高了吸附能力和再生能力.
了解禁用机制是工业应用中吸附剂长期稳定性的关键.

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