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Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

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端到端学习的衍射成像系统 lithography 适应设计使用层次动态模拟.

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此摘要是机器生成的。

这项研究引入了一种新的衍射成像系统设计,该设计可以解释制造错误. 该方法提高了对高度误差的稳定性,这对于可靠的衍射光学元件性能至关重要.

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科学领域:

计算机成像成像技术
光学系统的设计设计.
石版画是一种刻画.

背景情况:

现有的衍射成像系统设计方法与高效的衍射模拟作斗争.
石版工艺高度错误会对成像系统性能产生负面影响,原因是与连续模型的偏差.

研究的目的:

提出一个端到端衍射成像系统设计方法,该设计方法结合了石版工艺特征.
为了减轻波折光学元件 (DOE) 的高度误差的影响.

主要方法:

利用一个层次的离散模型进行模拟,限制了 lithography 的高度分布.
在点差函数 (PSF) 计算中实现了动态零填充,以提高速度.
共同优化了能源部和图像重建网络 (关闭的Wiener-Lucy链) 的端到端.

主要成果:

在PSF计算中实现了51.78%的速度增加.
与连续的DOE设计相比,拟议的方法显示出对高度错误的更高的稳定性.
重建的图像显示PSNR小幅下降0.3dB,但改进了对错误的容忍度.

结论:

开发的方法有效地将石版工艺的限制整合到DOE设计中.
这种方法为面对制造缺陷的衍射成像系统提供了强大的解决方案.
为未来的DOE设计提供了有价值的参考,考虑到制造过程的特点.