铁积累及其化对皮层内植入物中氧化应激的影响
Melissa E Franklin1, Jordan L Grant1, Grant M Lee1
1Department of Biomedical Engineering, University of Miami, Miami, FL, USA.
Acta biomaterialia
|May 12, 2025
概括
大脑植入部位的铁积累会导致氧化应激和神经元损伤. 铁化疗法减少了这种损伤,改善了神经元的存活率和设备功能,突出了铁的作用.
科学领域:
- 神经科学是一个神经科学.
- 生物材料科学 生物材料科学
- 免疫学 免疫学 免疫学
背景情况:
- 皮质中的长期微电极可靠性受到电极-组织接口上的异物反应的限制.
- 植入破坏了血脑屏障,导致免疫细胞激活,红细胞释放,随后铁积累.
- 过量的铁通过芬顿反应驱动活性氧物种 (ROS) 生产,导致氧化应激和细胞损伤.
研究的目的:
- 为了研究铁的积累及其下游氧化应激效应在电极-组织接口内皮层微电极植入后.
- 评估铁化疗法在减轻铁介导损伤和改善神经元存活率和设备性能方面的疗效.
主要方法:
- 植入一个16通道的微电极阵列 (MEA) 进入大鼠体感皮质.
- 测量NOX复杂子单位以评估氧化应激.
- 给一个单独的动物群体服用铁化剂德胺甲酸盐 (DFX).
主要成果:
- 氧化复杂子单元的显著升高表明植入后持续的氧化应激.
- 用DFX化铁降低了铁铁含量和氧化应激和损伤标志物.
- 用DFX治疗的动物表现出增加的神经元细胞体表达和改善电生理功能.
结论:
- 在电极-组织接口上的铁积累在中介氧化应激和神经元损伤方面发挥着至关重要的作用.
- 铁化是一种可行的策略,可以调节铁含量,减少氧化应激,并提高皮质内植入物的长期性能.
- 这项研究为铁对皮质内植入物疗效的影响提供了新的见解,与神经退行性疾病和脑损伤相关.
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