研究在水性HF-HClO4混合物中的溶解行为
Ann-Lucia Neumann1,2, André Stapf1, Nils Schubert1
1Technische Universität Bergakademie Freiberg, Department of Chemistry, Physics and Biosciences, Institute of Inorganic Chemistry Leipziger Str. 29 D-09599 Freiberg Germany Edwin.Kroke@chemie.tu-freiberg.de.
蚀刻使用湿化学工艺,如HF-HNO3. 使用HF- ((HCl) -Cl2混合物的替代方法避免了NO的形成,而高酸即使在Si-H终端表面也表现出惰性.
科学领域:
- 材料科学 材料科学 材料科学
- 化学工程是化学工程的重要组成部分.
- 表面化学 表面化学
背景情况:
- 湿化学蚀刻对于半导体和光伏行业的加工至关重要.
- 常见的蚀刻系统包括酸-酸 (HF-HNO3).
- 氧化 (NOx) 的形成在一些蚀刻过程中是令人担忧的.
研究的目的:
- 探索替代蚀刻方法,以减轻NOx的形成.
- 为了研究酸-酸- (HF-HCl) -Cl2) 混合物用于蚀刻的有效性.
- 为了评估酸与表面的反应性,特别是 Si-H 终端的表面.
主要方法:
- 对的湿化学蚀刻工艺的研究.
- 对包括HF-HNO3和HF-HCl) -Cl2在内的蚀刻混合物的分析.
- 关于酸与表面相互作用的实验研究.
主要成果:
- -HCl-Cl2混合物为蚀刻提供了-HNO3的替代品,可能避免NOx的形成.
- 发现高酸是一种非常强大的氧化剂.
- 即使是用 (Si-H) 终结的表面在暴露于酸时也表现出惰性.
结论:
- 存在替代蚀配方,可以防止NOx副产品的形成.
- 甲酸具有强烈的氧化特性,但不会与Si-H终结表面发生反应,这表明其具有特定应用的潜力.
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