高性能原子层沉积双门InGaO薄膜晶体管
Chenchen Ye1, Jiakang Li1, Peiyan Hong1
1Wuhan National High Magnetic Field Center, School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan 430074, China.
Nano letters
|May 15, 2025
概括
在氧化物 (IGO) 薄膜晶体管 (TFT) 中局部O3处理无形氧化物半导体 (AOSs) 提高了性能. 这种方法克服了值电压和移动性之间的权衡,使高性能集成电路成为可能.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 电子工程 电子工程
背景情况:
- 无形氧化物半导体 (AOSs) 提供高载体密度,低热预算和大带隙.
- 在AOS中,高电子密度导致关闭特性不佳,从而产生值电压 (Vth) 和移动性 (μ) 的权衡.
研究的目的:
- 开发高性能双门 (DG) 氧化 (IGO) 薄膜晶体管 (TFT).
- 为了克服AOSs中Vth和μ之间的固有权衡.
- 为了实现先进的单立体三维 (M3D) 集成电路.
主要方法:
- 在IGO通道区域利用局部O3处理来被动化氧空缺 (Vo).
- 制造的增强模式IGO DG TFT具有100 nm的短通道长度 (Lch).
主要成果:
- 在IGO DG TFT中实现了积极的Vth和高流动性.
- 证明了理想的下值斜率 (SS) 为63mV/dec.
- 报告的最大排水电流 (IDS) 为1.36mA/μm,记录的传导率 (gm) 为1008μS/μm.
结论:
- 局部化的O3处理有效地减轻了IGO TFT中的Vth-μ权衡.
- 高性能IGO DG TFT对下一代M3D集成电路具有前景.
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