接口极化切换在Al0.92Sc0.08N/GaN异构结构中,由喷射式化生长
Niklas Wolff1,2, Georg Schönweger1,3, Md Redwanul Islam1
1Department of Material Science, Kiel University, Kaiserstr. 2, D-24143, Kiel, Germany.
概括
在化 (GaN) 上培养的高度连贯的铁电化 (AlScN) 薄膜显示了对先进的晶体管和存储器设备至关重要的域切换机制.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 纳米技术 纳米技术
背景情况:
- 将铁电AlScN集成到GaN是新型高功率晶体管和内存设备的关键.
- 了解铁电域结构及其电气影响对于设备优化至关重要.
研究的目的:
- 为了证明高连贯性Al0.92Sc0.08N薄膜在GaN上的喷射表.
- 研究Al0.92Sc0.08N/GaN异构结构中的铁电域结构和切换机制.
主要方法:
- 为薄膜生长提供喷射表皮.
- 扫描传输电子显微镜 (STEM) 用于域成像.
- 电子能量损失光谱 (EELS) 用于电子结构分析.
主要成果:
- 在接近格子匹配的GaN上展示了高度连贯的Al0.92Sc0.08N膜.
- 揭示了极域和界面切换机制,启动了极化逆转.
- 在切换后,在Pt电极接口上确定了持久的M极性域.
结论:
- 洞察到铁电领域的位置和原子结构在喷雾沉积的Al0.92Sc0.08N/GaN.
- 与MOCVD培养的片进行比较,有助于了解缺陷结构.
- 通过接口和缺陷工程,知识支持未来非挥发性内存和晶体管设备的开发.
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