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三核锡复合体用于高级刻版:通过双重交联系统的协同效应提高灵敏度
Xiaofeng Gong1, Zijian Chen1, Daohan Wang1
1State Key Laboratory of Fine Chemicals, Frontiers Science Center for Smart Materials, Dalian University of Technology, Dalian 116024, P. R. China.
Inorganic chemistry
|June 7, 2025
概括
三核锡复合物增强了极紫外线 (EUV) lithography 的灵敏度和图案真实性. 由于双重交联机制,Vi-Sn-Oc复合体显示出高分辨率和灵敏度.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 化学工程是化学工程的重要组成部分.
背景情况:
- 极端紫外线 (EUV) 石版面临着在高灵敏度与纳米尺度图案忠实性之间取得平衡的挑战.
- 基于有机蛋白的三核宏环复合物为改善EUV光电阻性能提供了潜力.
- 光子射击噪声会导致石版图案的粗.
研究的目的:
- 为了研究有机基对三核复合光电阻的灵敏度的影响.
- 评估特定三核锡复合体在高分辨率图案设计中的性能.
- 阐明Vi-Sn-Oc增强灵敏度背后的机制.
主要方法:
- 四种三核复合物的合成和表征,具有不同的有机组.
- 使用电子束 lithography (EBL) 和EUV lithography对光电阻的灵敏度的评估.
- 关于辐射暴露的机制研究,以了解溶解度变化和交联行为.
主要成果:
- 具有CC键和长基组的Vi-Sn-Oc复合体表现出极好的灵敏度 (D0 = 23μC/cm2) 和高分辨率图案 (16nm线通过EBL,20nm线通过EUV).
- 三核锡复合体在高灵敏度下成功实现了纳米尺度图案忠实性.
- 机械研究表明,协同作用的双交联系统 (Sn-X-Sn和CC) 是Vi-Sn-Oc增强灵敏性的来源.
结论:
- 三核锡复合物在EUV光刻中有效地实现高灵敏度和纳米尺度图案忠实性.
- Vi-Sn-Oc复合体代表了先进的光电阻应用的有希望的材料.
- 鉴定到的协同交叉连接机制为开发下一代高灵敏度,高分辨率的氧化EUV光电阻提供了新的途径.
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