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InP光学相位阵列用于通过散射介质进行高速波面成型的光学相位阵列.

Zhiyu Chen, Marco Gagino, Yuchen Song

    Optics letters
    |June 13, 2025
    PubMed
    概括

    研究人员开发了一种新的InP光学相位阵列 (OPA),用于通过散射介质更快地塑造波面. 这项技术实现了前所未有的速度和高功率,推进了成像和通信领域的应用.

    科学领域:

    • 光子学是指光子学的使用方法.
    • 光学工程是指光学工程.
    • 材料科学 材料科学 材料科学

    背景情况:

    • 波面造型 (WFS) 能够通过散射介质控制光线,用于非视线 (NLOS) 成像和光学无线通信等应用.
    • 传统的空间光调节器 (LC-SLM,DMD) 具有有限的刷新率 (kHz),阻碍了多通道的实时WFS.

    研究的目的:

    • 通过散射介质通过InP光学相位阵列 (OPA) 演示高速波面成型.
    • 为了克服现有的空间光调节器的速度限制,用于先进的光学应用.

    主要方法:

    • 使用InP光学相位阵列 (OPA) 进行光波面的空间调制.
    • 采用芯片上的电光调制来进行相位控制.
    • 集成的放大器来提高输出功率.

    主要成果:

    • 实现了创纪录的12MHz调制带宽,明显超过当前技术.
    • 证明高输出功率高达15.4dBm,芯片上净增益为10.3dB.
    • 通过高速度的散射介质成功执行波面成型.

    结论:

    • InP OPA为WFS的调制速度提供了两次数的改进.

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  • InP OPAs的高功率和速度适用于像NLOS成像和高速光通信这样的苛刻应用.
  • InP OPAs代表了实时,高频道计数波操纵的重大进步.