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通过减小线程位移密度的应变松散模板,通过c平面InGaN激光二极管的增强光学增益
Optics express
|June 14, 2025
概括
这项研究使用纳米图案和表轴侧增长减少了GaN菌株放松模板中的线程位移密度. 这提高了蓝边发射激光二极管的性能,降低了门电流密度,提高了材料收益.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 光电学是指光电子产品.
背景情况:
- 基于GaN的材料中的线程位移 (TDD) 降低了设备的性能.
- 在c平面上的应变松散模板 (SRT) 对于高性能光电子非常重要.
- 在先进的激光二极管应用中,减少SRT中的TDD至关重要.
研究的目的:
- 开发和演示一种方法,以显著减少c平面SRT中的TDD.
- 为了提高在这些改进的SRT上制造的电气的蓝边辐射激光二极管 (EELD) 的性能.
主要方法:
- 在c平面基板上采用纳米图案和蚀刻技术.
- 使用化 (GaN) 的表轴侧增长 (ELO).
- 在修改后的SRT上制造和表征EELD.
主要成果:
- 从超出可测量的水平降低到1.8×10^9/cm^2.2.的TDD.
- 证明了具有7.4 kA/cm^2.2.的门电流密度 (Jth) 的EELD.
- 报告的内部光学损失低至8-10cm^-1和50%以上的增强材料收益.
结论:
- 开发的纳米图案/ELO方法有效地减少了c平面SRT中的TDD.
- 与传统设备相比,改进的SRT带来了优越的EELD性能.
- 这种方法为高效的基于GaN的光电子设备提供了一条途径.
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