概括
这项研究引入了一种新的方法,用于使用触角弧长 (TAAL) 曲线进行曲线面罩光学近距离校正 (OPC). 基于TAAL的小选择与定向移动 (SSDM) 方法简化了控制点操作,并减少了模式错误 (PAE).
科学领域:
- 半导体制造业 半导体制造业
- 摄影石版印刷 (photolithography) 是一种摄影方式.
- 计算式 lithography 的使用方法.
背景情况:
- 曲线面罩为先进的半导体节点提供了卓越的光刻图像质量.
- 目前用于曲线面罩的光学近距离校正 (OPC) 方法涉及复杂的算法,并且经常产生低于最佳的打印图像保真度.
- 控制点的选择和操纵是曲线面具OPC的关键但具有挑战性的步骤.
研究的目的:
- 开发一种简化,更有效的曲线面罩光学近距离校正 (OPC) 方法.
- 为了减少计算复杂性和提高石版印刷图像的真实性.
- 引入OPC中控制点选择和移动的新方法.
主要方法:
- 使用一维触角弧长 (TAAL) 曲线表示2D曲线面罩边界.
- 介绍基于TAAL曲线表示的方向运动 (SSDM) 小选择方法.
- 通过模拟,将基于TAAL的SSDM方法与统一选择和随机移动方法进行比较.
主要成果:
- TAAL曲线简化了控制点的选择和运动方向的确定.
- 与现有的OPC方法相比,基于TAAL的SSDM方法显著降低了计算复杂性.
- 模拟结果显示,使用基于TAAL的SSDM方法,模式错误 (PAE) 显著减少.
结论:
- 在TAAL曲线提供了一种有效的方式来表示和操纵OPC的曲线面具边界.
- 基于TAAL的SSDM方法提供了一个有前途的解决方案,用于提高先进光刻的精度和效率.
- 这种方法减轻了与当前OPC技术中复杂算法和低于最佳的打印图像保真度相关的挑战.
相关概念视频
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