相关实验视频
Updated: Sep 17, 2025

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Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
Published on: November 1, 2013
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化多通道器件具有锁式诱导的每十年低于60mV的下值斜率,用于射频应用
Akhil S Kumar1, Stefano Dalcanale1, Michael J Uren1
1Center for Device Thermography and Reliability, H. H. Wills Physics Laboratory, University of Bristol, Bristol, UK.
概括
研究人员在多通道化 (GaN) 晶体管中发现了可逆晶体管锁定现象. 这种锁定是由局部冲击电离引起的,可以提高射频功率放大器的性能.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 电子工程 电子工程
背景情况:
- 化/化 (AlGaN/GaN) 超晶格式化场效应晶体管是高功率射频 (RF) 应用的关键.
- 这些先进的GaN晶体管的可靠性和操作机制仍然不完全理解.
研究的目的:
- 为了研究晶体管在多通道GaN晶体管中锁定晶体管的现象.
- 为了阐明对观察到的锁定行为负责的潜在物理机制.
- 评估锁定对设备性能的影响及其对射频功率放大器的潜在好处.
主要方法:
- 制造具有不同翅膀宽度的多通道GaN晶体管.
- 详细的电流-电压 (I-V) 特性,以确定锁定条件.
- 电气模拟用于模拟设备行为.
- 电光测量与电气测量相关联.
主要成果:
- 观察到晶体管锁定,其特点是在特定的门电压下急剧增加排水电流.
- 锁定是由局部冲击电离触发的,这取决于从制造开始的翅膀宽度变化.
- 锁定现象是可逆的,不会降低设备的性能.
- 锁定改善了传导率,表明RF放大器的线性和功率得到了增强.
结论:
- 在GaN晶体管中,翅膀宽度的变化可以诱导有益的,可逆的锁定效应.
- 局部冲击电离是这种锁定现象背后的主要机制.
- 这一发现为增强基于GaN的射频功率放大器的性能提供了一条途径.
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