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激光异质干扰测量基于电光调制双侧带的纳米位移测量

Shuwei Zhang, Xiaoping Li, Haifeng Sun

|July 1, 2025

概括

我们开发了一种新的双频激光方法,用于精确的纳米位移测量. 这种电光调制技术实现了低于3nm的精度和线性,非常适合高速工业计量.

科学领域:

光学和光子学在光学和光子学.
计量学计量学计量学
纳米技术纳米技术

背景情况:

传统的双频激光技术可能会遇到对称侧带生成问题和偏振别名错误.
精确的纳米尺度位移测量对于工业计量学和纳米技术的进步至关重要.

研究的目的:

提出和验证一种用于纳米位移测量的新型双频激光异质干扰测量方法.
通过使用电光调制 (EOM) 来克服传统方法的局限性,用于信号生成.

主要方法:

利用电光调制 (EOM) 产生严格对称的双侧带信号,抑制极化别名错误.
集成的光学数字连贯检测与一个全相快速里埃变换 (apFFT) 边缘计数算法用于纳米尺度估计.
进行实验,以评估在高速测量期间的分辨率,精度,线性和性能.

主要成果:

实现了比3nm更好的纳米位移测量分辨率.
证明了微位移测量精度为3nm.
在100毫米范围的高速测量 (0.1米/秒) 中保持了0.0015%的优异线性.

结论:

拟议的基于EOM的双频激光方法为纳米位移测量提供了卓越的性能.
该技术的高精度,线性和速度使其适用于苛刻的工业计量和纳米技术应用.
这种新的方法解决了现有方法的关键局限性,为提高精度的测量系统铺平了道路.

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