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电气性能和p-CuGaO2/β-Ga2O3电力电子器件异质连接的深层陷特性
Chowdam Venkata Prasad1,2, Geon-Hee Lee3, Jang Hyeok Park1,2
1Department of Semiconductor Systems Engineering and Convergence Engineering for Intelligent Drone, Sejong University, Seoul 05006, Republic of Korea.
ACS applied materials & interfaces
|July 8, 2025
概括
研究人员探索了p-CuGaO2 / β-Ga2O3异构连接,以克服p型兴奋剂在β-Ga2O3电源设备中的挑战. 这种异质连接显示了改进的电气特性和减少的陷状态,提高了设备的性能.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 电气工程 电气工程
背景情况:
- 氧化 (β-Ga2O3) 是动力电子产品的一个有前途的材料.
- 有效的p型兴奋剂仍然是β-Ga2O3器件面临的重大挑战.
- 开发双极设备需要克服p型导电性的局限性.
研究的目的:
- 研究p-CuGaO2/β-Ga2O3异质连接 (HJ) 的电特性.
- 在HJ结构中分析深层陷状态.
- 评估这个HJ在先进功率电子方面的潜力.
主要方法:
- 制造和p-CuGaO2/β-Ga2O3 HJ的电气特性.
- 与Pt/β-Ga2O3 Schottky屏障二极管 (SBD) 的比较.
- 深层瞬态光谱 (DLTS) 用于陷分析.
主要成果:
- 与SBD相比,HJ显示开启电压 (Von) 和启动电阻 (Ron) 的降低.
- 在HJ.中,实现了1.054kV的最大故障电压.
- 观察到接口状态密度 (NSS) 的显著降低和陷特征的调制.
结论:
- p-CuGaO2/β-Ga2O3 HJ为提高β-Ga2O3电源设备性能提供了一个可行的解决方案.
- 集成p-CuGaO2介层有效地修改陷状态并改善设备特性.
- 这种方法对基于β-Ga2O3的可靠和高性能功率电子产品充满希望.
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