() .

Wenhao Wang1,2, Zhensheng Zhang1,2,3, Xuefeng Song1,2,3

  • 1Shenzhen Institute for Quantum Science and Engineering, Southern University of Science and Technology, Shenzhen 518055, People's Republic of China.

Nanotechnology
|July 9, 2025
PubMed
概括

这项研究验证了一种新的灰度电子束光刻法 (EBL) 方法,用于在PMMA膜上直接制造3D结构. 该技术通过更少的步骤和更好的结构质量实现了亚纳米深度分辨率.