GaN,

Yixu Yao1, Sen Huang2, Ruyue Cao3,4

  • 1Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China.

Nature communications
|July 11, 2025
PubMed
概括

这项研究揭示了在化 (GaN) 中的脱位沿着不同的电子和孔运输机制. 在GaN设备中,更高的边缘位移密度通过减轻电子捕获来减少降解.

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