基于光谱对焦原理的光学元件表面下缺陷的总内部反射检测技术的研究
Rongcai Bao1, Kaige Qu1, Lu Wu1
1College of Engineers, Robotics and Intelligent Manufacturing Engineering, Zhejiang University, Hangzhou 310000, China.
Sensors (Basel, Switzerland)
|July 12, 2025
概括
这项研究引入了一种新的光谱共聚焦散射测量方法,用于检测光学元件的地下缺陷. 该技术实现了高精度,非破坏性检测,轴分辨率为0.8μm.
科学领域:
- 光学和光子学 在光学和光子学.
- 材料科学 材料科学 材料科学
- 计量学 计量学 计量学
背景情况:
- 精密光学元件的表面缺陷通过增强光场,增加激光吸收和减少机械性能来降低性能.
- 高精度的定量自动检测这些缺陷对于光学元件制造至关重要.
- 现有的方法可能在分辨率,深度上有局限性,或需要光物质.
研究的目的:
- 开发和验证一种新的,非破坏性的方法,用于高精度检测光学元件的地下缺陷.
- 为了实现内部缺陷的准确深度和位置测量.
- 为了克服当前缺陷检测技术的局限性.
主要方法:
- 设计了一种光谱共聚焦散射测量系统,采用散射透镜组 (480-670 nm).
- 该系统集成了光谱对焦技术和总内部反射,以最大限度地减少表面散射光干扰.
- 该方法在不需要光物质的情况下运行,允许进行非破坏性评估.
主要成果:
- 开发的方法实现了0.8微米的轴分辨率.
- 证明了0.94毫米的测量深度范围.
- 实验验证证了地下缺陷深度和位置的准确测量.
结论:
- 谱共聚焦散射测量方法是可行的和有效的,用于高精度,非破坏性检测地下缺陷.
- 这种技术为精密光学元件制造的质量控制提供了显著的进步.
- 该方法提供了对性能评估至关重要的缺陷特征的可靠量化数据.
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