化薄膜的物理和电气性能 薄膜具有不同的氧比率
Wen-Jie Chen1, Yang-Chao Liu2,3, Zhen-Yu Wang2,3
1Institute of Wide Bandgap Semiconductor Materials and Devices, Research Institute of Fudan University in Ningbo, Ningbo 315327, China.
Nanomaterials (Basel, Switzerland)
|July 12, 2025
概括
氧化 (SiON) 薄膜提供可调节的折射率. 调整氧化成分会影响结构质量和设备电容,这对于功率电子应用至关重要.
科学领域:
- 材料科学 材料科学 材料科学
- 薄膜技术 薄膜技术
- 半导体物理 半导体物理
背景情况:
- 氧化 (SiON) 是SiO2和Si3N4.4之间的中间材料.
- 锡安薄膜提供可调节的折射率从1.45到2.3.
- SiON组成和电影质量之间的关系尚未完全理解.
研究的目的:
- 研究血增强化学蒸汽沉积 (PECVD) 参数对SiON薄膜特性的影响.
- 了解元素组成如何影响结构质量和介电行为.
- 与折射率,表面粗度和缺陷密度相关联薄膜固态度.
主要方法:
- 在PECVD中,前体气体选择和流量比率的系统变化.
- 试验测量薄膜特性,包括折射率和表面粗度.
- 电容-电压 (C-V) 特性用于设备电容分析.
主要成果:
- 立体测量SiON (x=y) 的表面粗度最低为0.18 nm.
- 减少氧气和增加含量导致Si-O键被Si-N键取代.
- 这种组成变化与结构缺陷密度增加和设备容量增强相关.
结论:
- 控制调制SiON薄膜固态度,精确地定制介电性质和电容性行为.
- 了解这些机制有助于推进SiON在功率电子中的应用.
- SiON的调节性质使其成为先进电子设备的多功能材料.
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