在反意义寡核酸中区分n-1定位异构体,使用正交的LCMS方法
Zifan Li1, Xiaoqing Kong1, Xiao Zhou1
1Pharmaceutical Operations & Technology, Biogen, 225 Binney Street, Cambridge, Massachusetts 02142, United States.
鉴定治疗性寡核酸合成中的关键杂质是关键. 我们开发了方法来区分和量化NMA PS ASO中的特定删除杂质 (n-NMA 5-甲基细胞素),改善质量控制.
科学领域:
- 橄核酸的化学成分
- 分析化学 分析化学
- 制药科学 制药科学
背景情况:
- 治疗性寡核酸质量取决于控制与产品相关的杂质.
- 杂质的n-1类,特别是n减去NMA5-甲基细胞素 (n-NMA MeC),是NMA PS ASO合成的主要问题.
- n-NMAMeC的定位异构体是异构体,这使得标准高分辨率质谱的差异化具有挑战性.
研究的目的:
- 在NMA PS ASO中开发和比较五种异构 n-NMA MeC 杂质的正交方法.
- 为了准确量化这些杂质,并在合成过程中确定它们的来源.
- 为了减轻治疗性寡核酸制造中的关键n-1杂质的形成.
主要方法:
- 脱硫NMA PS ASO以增强染色学分离,并使n-NMA MeC异构体的LCMS量化.
- 直接碎片化 (MS/MS) 的n-NMAMeC杂质使用独特的碎片离子量化.
- 两种方法的比较,用于分辨和量化最多五个同位素n-1杂质.
主要成果:
- 无论是脱硫-LCMS还是直接MS/MS碎片化,都成功地区分和量化了五种异构体的n-NMAC杂质.
- 在NMAMeC核酸在序列的5'末端的低合效率被确定为这些杂质的主要来源.
- 该研究确定了在NMA PS ASO.中解决复杂的n-1杂质概况的可行性.
结论:
- 正角分析策略使NMA PS ASO中关键n-1杂质的准确表征成为可能.
- 了解特定序列合成的挑战,如5'-end NMA MeC位点的低合效率,对于杂质控制至关重要.
- 实施有针对性的合成工艺改进可以有效地减轻n-1杂质的形成,提高治疗性寡核酸质量.
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