Jia-Liang Xie1,2, Tao Liu1,2, Yu-Chen Leng1

  • 1State Key Laboratory of Semiconductor Physics and Chip Technologies, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China.

概括

现在可以预测 anisotropic layered materials (ALMs) 的角度分辨率极化拉曼 (ARPR) 光谱. 这项研究引入了内在的拉曼张量来准确预测ARPR强度,简化了ALM光学属性的分析.