增强了耐NBTI双模式施密特触发电路的软错误适应性
Aryan Kannaujiya1, Ambika Prasad Shah2
1IC-ResQ Lab, Department of Electrical Engineering, Indian Institute of Technology Jammu, Jammu, J&K, 181221, India.
Scientific reports
|July 16, 2025
概括
一个新的双模式逆转施密特触发器 (DM-IST) 电路显著提高了可靠性和性能. 这种设计提供了更好的防噪能力和长期稳定性,特别是在辐射严重的环境中.
科学领域:
- 电气工程和计算机科学
- 微电子和集成电路设计
背景情况:
- 传统的施密特触发电路由于负偏差温度不稳定性 (NBTI) 而遭受性能退化.
- 电子电路的可靠性和防噪能力至关重要,尤其是在恶劣的环境中.
- 现有的设计往往缺乏对长期操作压力和辐射的强度.
研究的目的:
- 提出和分析一种新的双模式逆转施密特触发器 (DM-IST) 电路.
- 为了评估DM-IST电路对负偏差温度不稳定性 (NBTI) 的弹性.
- 评估电路在辐射下的性能及其与传统设计相比的整体效率.
主要方法:
- 设计了一个使用单个PMOS和五个NMOS晶体管的新电路拓.
- 在Cadence Virtuoso中使用40nm UMC技术进行了模拟.
- 分析包括NBTI压力,辐射效应 (双指数电流注入) 和性能指标评估.
主要成果:
- 拟议的DM-IST电路在10年内在NBTI下的值电压转移中表现出1.43倍的改进.
- 歇斯底里斯宽度提高了1.39×,临界电荷增加了2.89×,门电流增加了2.02×.
- 在动力功率 (2.94×),泄漏功率 (1.89×),传播延迟 (1.60×) 和功率延迟产物 (4.71×) 中观察到显著改善.
结论:
- DM-IST电路表现出卓越的效率,增强的噪声免疫力和可靠的长期运行.
- 该设计在辐射诱导的环境中显示出了显著的弹性.
- 拟议的电路对于要求高可靠性和性能的应用是一个有前途的替代方案.
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