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强度调节的光发光谱学用于揭示化烯矿中的离子过程

Sarah C Gillespie^1,2, Agustin O Alvarez¹, Jarla Thiesbrummel¹

¹LMPV-Sustainable Energy Materials Department, AMOLF Institute, Science Park 104 Amsterdam, 1098XG, The Netherlands.

ACS energy letters

|July 17, 2025

概括

强度调节光发光谱学 (IMPLS) 提供了一种新的,无接触的光学方法,用于研究化 PeroVskites中的移动离子. 这种技术克服了电气方法的局限性,使人们能够更好地理解对设备性能至关重要的离子扩散.

科学领域:

材料科学材料科学材料科学
固态物理固态物理
光子设备光子设备

背景情况:

化矿中的移动离子显著影响设备性能,但其属性难以量化.
现有的电气技术仅限于操作设备,并且可以通过接口重组来掩盖,阻碍对离子贡献的研究.

研究的目的:

引入和验证强度调制光发光谱学 (IMPLS) 作为一种全光学,无接触的方法,用于在化物矿中表征移动离子.
为了证明IMPLS在区分不同离子过程中的能力,例如缺陷形成和扩散.

主要方法:

使用强度调节的光发光谱学 (IMPLS) 来测量光发光强度的振幅和相位作为激发调节频率的函数.
应用了一种光学等效电路模型,以适应从Cs$_{0.07}$(FA$_{0.83}$MA$_{0.17}$) $_{0.93}$Pb-(I$_{0.83}$Br$_{0.17}$) $_{3}$矿膜中获得的IMPLS数据.
与相应设备上的强度调制光电/光电谱学 (IMPS/IMVS) 测量相关的IMPLS发现.

主要成果:

从IMPLS数据中确定了两个特征性寿命:2.1毫秒 (可能的缺陷形成) 和77秒 (可能的离子扩散).
观察到的离子扩散特征与IMPS/IMVS测量的结果一致.
在各种矿样品类型,包括薄膜和完整设备上证明了IMPLS的有效性.

结论:

IMPLS是一种强大的,非侵入性的光学技术,用于表征化矿中缓慢的离子过程.
这种方法克服了电气表征的局限性,为移动离子行为提供了新的见解.
IMPLS显著扩大了用于理解和优化电子和光子应用的矿材料的可用工具包.

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