基于离子迁移机制的高级包装BEOL中TDDB和LER效应的SPICE兼容降解建模框架
Shao-Chun Zhang1,2, Sen-Sen Li3, Ying Ji3
1Information Science Academy, China Electronics Technology Group Corporation, Beijing 100142, China.
Micromachines
|July 30, 2025
概括
半导体设备中的时间依赖介电分解 (TDDB) 是使用金属离子迁移进行建模的. 这种新的SPICE兼容模型准确地预测了设备的寿命,并结合了线边粗度以提高可靠性预测.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 半导体物理 半导体物理
背景情况:
- 时间依赖的介电分解 (TDDB) 是半导体设备和先进包装中的关键故障机制.
- 在金属间介电层内的金属离子迁移是TDDB的主要驱动因素.
- 准确的建模对于预测设备寿命和可靠性至关重要.
研究的目的:
- 开发一种与SPICE兼容的模型,用于由金属离子迁移引起的TDDB降解.
- 将线边粗度 (LER) 的影响纳入降解模型.
- 通过计算过程变化来提高设备寿命预测的准确性.
主要方法:
- 基于金属离子迁移和导电线丝演变的物理学,开发了一个与SPICE兼容的模型.
- 该模型与数值结果对准确性进行了验证.
- 使用功率光谱密度 (PSD) 的过程变化模型被整合到量化LER效应中.
主要成果:
- 开发的模型准确地预测了在各种操作条件下 (电压,温度,结构) 的电阻变化和设备寿命.
- 通过PSD模型将LER纳入PSD模型可以显著提高预测寿命曲线的准确性.
- 该模型有效地捕捉了由于制造不均性的可靠性变化.
结论:
- 拟议的SPICE兼容模型为理解和预测TDDB退化提供了一个强大的框架.
- LER显著影响设备的可靠性,其纳入模型对于准确的寿命预测至关重要.
- 这项工作为提高半导体设备和先进包装的可靠性提供了有价值的工具.
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