使用道结接触层和不对称极化诱导的兴奋剂电子阻断层的254nm DUV LED 的性能提升
Optics express
|July 30, 2025
概括
这项研究引入了45纳米道连接接触层和不对称的极化诱导的兴奋剂电子阻断层,以改善深紫外线发光二极管 (DUV LED). 这些创新提高了孔注入和抑制电子泄漏,提高了设备的效率.
科学领域:
- 光电学是指光电子产品.
- 半导体设备 半导体设备
- 材料科学 材料科学 材料科学
背景情况:
- 在254纳米的深紫外线发光二极管 (DUV LED) 由于低p型兴奋剂和电子泄漏,与低效的孔注射作斗争.
- 高Al含量的AlGaN在DUV LED设备中对高效的孔运输提出了挑战.
研究的目的:
- 为了增强孔注射和抑制254nmDUVLED中的电子泄漏.
- 为了研究道结 (TJ) 接触层 (CL) 和不对称的极化诱导兴奋剂 (PID) 电子阻断层 (EBL) 的有效性.
主要方法:
- 使用半导体设备高级物理模型 (APSYS) 软件模拟设备性能.
- 对不同TJ CL厚度和EBL设计 (V形,对称PID,不对称PID) 的DUVLED进行比较分析.
主要成果:
- 一个45nm的TJ CL改善了孔生成和降低了开启电压,但并没有单独解决电子泄漏问题.
- 不对称的PID EBL通过增加电子的导电带屏障,有效地抑制了电子泄漏.
- 结合45纳米的TJ CL和不对称的PID EBL显著增强载体注入,导致更高的辐射重组和自发发射.
结论:
- 45nm TJ CL 和非对称 PID EBL 的组合是一种有希望的理论方法,可以克服 254nm DUV LED 中的孔注射限制.
- 这种优化的结构在75mA的注入电流下实现了25.1%的内部量子效率 (IQE) 和6.0mW的输出功率.
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