概括
研究人员研究了将矩形和曲的次分辨率辅助功能 (SRAF) 添加到逆光刻技术 (ILT) 的初始口罩中. 矩形SRAF显著提高成像质量,减少曼哈顿转换后的关键维度误差.
科学领域:
- 半导体制造业 半导体制造业
- 光学石版印刷是一种光学石版印刷.
- 计算式 lithography 的使用方法.
背景情况:
- 逆光刻技术 (ILT) 对于先进的半导体图案设计至关重要.
- 小分辨率辅助功能 (SRAFs) 对于提高面具保真度和过程窗口至关重要.
- 最初的面具的设计显著影响ILT的性能和最终的图案质量.
研究的目的:
- 调查曲线和矩形SRAF对ILT性能的影响.
- 在最初的面具设计中,比较矩形和形SRAF的有效性.
- 评估SRAF对关键维度 (CD) 控制和焦点深度 (DOF) 的影响.
主要方法:
- 使用基于水平集的ILT框架.
- 在最初的3D表面施工阶段集成的SRAF.
- 开发并比较使用矩形SRAFs与曲面罩作为初始输入的方法.
主要成果:
- 曲线和矩形SRAF都能产生具有良好的成像质量的输出口罩.
- 长方形的SRAF在保持图像质量的曼哈顿后转换方面具有显著的优势.
- 矩形SRAF方法将CD误差降低了4%以上,并在转换后将DOF增加了超过35nm.
结论:
- 矩形SRAF在ILT中提供了卓越的性能,特别是在曼哈顿转换后.
- 拟议的方法允许最初的面具设计控制SRAF类型,简化后续的面具处理.
- 这种方法增强了CD控制和工艺窗口,减少了制造方面的挑战.
相关概念视频
01:37Super-resolution Fluorescence Microscopy
Super-resolution fluorescence microscopy (SRFM) provides a better resolution than conventional fluorescence microscopy by reducing the point spread function (PSF). PSF is the light intensity distribution from a point that causes it to appear blurred. Due to PSF, each fluorescing point appears bigger than its actual size, and it is the PSF interference of nearby fluorophores that causes the blurred image. Various approaches to achieving higher resolution through SRFM have recently been developed.
01:13Attenuated Total Reflectance (ATR) Infrared Spectroscopy: Overview
Attenuated total reflectance (ATR) infrared spectroscopy is a powerful analytical technique used to study the composition of materials. It is widely employed in chemistry, materials science, forensic science, and other fields where sample characterization is required. ATR has several advantages over traditional transmission IR spectroscopy, including the requirement of little to no sample preparation and the ability to analyze a wide range of samples.
The ATR process begins by directing a beam...
The ATR process begins by directing a beam...