Field Effect Transistor
Biasing of Metal-Semiconductor Junctions
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Xiaohan Zai1,2, He Dong1, Zihong Shen1
1State Key Laboratory of Flexible Electronics (LOFE) & Institute of Flexible Electronics (IFE), MIIT Key Laboratory of Flexible Electronics (KLoFE), Shaanxi Key Laboratory of Flexible Electronics, Northwestern Polytechnical University, 127 West Youyi Road, Xi'an, 710072, China.
锡基矿场效应晶体管 (FET) 面临着影响性能的缺陷的挑战. 本综述详细介绍了缺陷的起源,被动化策略以及高性能Sn基矿FET的未来方向.
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