在AlScN/AlN/AlScN堆中解离偏振和强制场,以提高铁电薄膜晶体管的性能
Kyung Do Kim1, Seung Kyu Ryoo1, Min Kyu Yeom1
1Department of Materials Science and Engineering and Inter-University Semiconductor Research Center, Seoul National University, Seoul, South Korea.
Nature communications
|August 11, 2025
概括
酸 (AlScN) 多层增强了铁电晶体管. 这种AlScN/AlN/AlScN结构改善了高级数据存储应用程序的内存窗口和保留.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 电气工程 电气工程
背景情况:
- 甘化 (AlScN) 由于其高强迫场,对铁电场效应晶体管 (FeFET) 是有前途的.
- 然而,AlScN的高余分极化可以限制内存窗口和保留,阻碍其在内存设备中的使用.
研究的目的:
- 在基于AlScN的FeFET中设计一个多层结构 (AlScN/AlN/AlScN) 来解两极化和强制场.
- 为了增强强制场,同时保持极化,提高记忆性能.
主要方法:
- 制造AlScN/AlN/AlScN的多层结构.
- 铁电特性和设备性能的表征.
- 研究AlN层在调节强制场和极化中的作用.
主要成果:
- AlN 层表现出 ferroelectric 切换作为对 AlScN 层的反应,尽管它本质上是压电.
- AlN的较低介电常数增加了堆的强制场,而AlScN则决定了极化.
- 增加AlN比率显著改善了无形--氧化通道的FeFET中的记忆窗口和保留.
结论:
- 多层AlScN/AlN/AlScN有效地解了极化和强制场,提高了FeFET的性能.
- 实现了15V的最大内存窗口,为五级细胞发展铺平了道路.
- 这种多层次的方法为下一代非易失性内存技术提供了可行的策略.
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