概括
研究人员使用反向设计开发了一种超紧的化极化束分离器 (PBS). 这种紧的PBS为光子集成电路提供了高性能和制造耐受性.
科学领域:
- 光子学是指光子学的使用方法.
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
背景情况:
- 极化束分离器 (PBS) 是集成光子学中的关键组件.
- 光子设备的小型化对于先进的光学系统至关重要.
- 化 (Si3N4) 为光子应用提供了出色的光学性能.
研究的目的:
- 在化 (Si3N4) 平台上设计一个超紧的极化束分离器 (PBS).
- 实现高性能指标,包括低插入损失和高灭绝率.
- 为了确保该设备具有高制造容忍度的可制造性.
主要方法:
- 利用了与非线性直接二进制搜索 (DBS) 算法的反向设计原理.
- 通过光学场分布分析模拟了设备性能.
- 关于蚀刻深度和直径变化的评估制造公差.
主要成果:
- 实现了2.4×4.8μm2.2的超紧的足迹.
- 在50 nm带宽 (1525-1575 nm) 上,已证明插入损失<0.89 dB (TE) 和<1.21 dB (TM).
- 获得的平均灭绝比为13.24 dB (TE) 和14.15 dB (TM).
- 展示了高的制造容忍度 (±50 nm蚀刻深度,±8 nm蚀刻直径).
结论:
- 设计的超紧的Si3N4 PBS满足了集成光子学的关键性能要求.
- 反向设计方法可以实现高效的,一阶段的光刻制造.
- 该设备对制造变化的强度使其适合实际实施.
相关概念视频
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