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相关概念视频

Atomic Emission Spectroscopy: Interference01:30

Atomic Emission Spectroscopy: Interference

274
In atomic emission spectroscopy (AES), high-temperature atomizers excite a broad range of elements and molecules that generate complex emissions from sources such as oxides, hydroxides, and flame combustion products in the flame or plasma. Several strategies can be employed to minimize spectral interferences caused by overlapping emission lines or bands. These include increasing instrument resolution, choosing alternative emission lines, optimally placing the detector in low-background regions,...
274
Atomic Absorption Spectroscopy: Interference01:25

Atomic Absorption Spectroscopy: Interference

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Interference leads to systematic error in atomic absorption (AA) measurements by enhancing or diminishing the analytical signal or the background. These interferences can be grouped into three main categories: spectral interference, chemical interference, and physical interference.
Spectral interference occurs when signals from other elements or molecules overlap with the analyte signal, falsely elevating or masking the analyte's absorbance. This interference can be corrected using Zeeman,...
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Uncertainty in Measurement: Reading Instruments02:46

Uncertainty in Measurement: Reading Instruments

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Counting is the type of measurement that is free from uncertainty, provided the number of objects being counted does not change during the process. Such measurements result in exact numbers. By counting the eggs in a carton, for instance, one can determine exactly how many eggs are there in the carton. Similarly, the numbers of defined quantities are also exact. For example, 1 foot is exactly 12 inches, 1 inch is exactly 2.54 centimeters, and 1 gram is exactly 0.001 kilograms. Quantities...
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Atomic Force Microscopy01:08

Atomic Force Microscopy

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Atomic force microscopy (AFM) is a type of scanning probe microscopy that can analyze topographic details of various specimens like ceramics, glass, polymers, and biological samples. AFM offers over 1000 times more resolution than the optical imaging system. Images generated from AFM are three-dimensional surface profiles, offering an advantage over the flat, two-dimensional images from other imaging techniques.
The AFM Probe
The probe is regarded as the heart of any AFM setup and comprises the...
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相关实验视频

Updated: Sep 11, 2025

Experimental and Data Analysis Workflow for Soft Matter Nanoindentation
13:04

Experimental and Data Analysis Workflow for Soft Matter Nanoindentation

Published on: January 18, 2022

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基于模型的连贯扫描干涉测量的错误源灵敏度分析用于薄膜计量学.

Lixuan Xu, Cheng Chen, Rong Su

    Applied optics
    |August 12, 2025
    PubMed
    概括

    使用连贯扫描干涉计 (CSI) 精确地测量薄膜厚度取决于精确的先前信息. 折射率是最关键的因素,微小的偏差显著影响二氧化薄膜厚度的准确性.

    科学领域:

    • 材料科学 材料科学 材料科学
    • 光学计量学 在光学计量学
    • 半导体制造业 半导体制造业

    背景情况:

    • 二氧化 (SiO2) 薄膜在半导体制造中对于屏障,绝缘和保护功能至关重要.
    • 一致扫描干扰度 (CSI) 提供高分辨率,大视野薄膜厚度测量.
    • 基于模型的CSI用于比系统的连贯度长度更薄的薄膜,需要事先提供信息.

    研究的目的:

    • 量化分析事先信息准确性对基于模型的CSI厚度测量的影响.
    • 识别和排名CSI测量对各种影响因素的敏感性.

    主要方法:

    • 量化分析结合了模拟和实验方法.
    • 影响因素的调查:摄像机噪声,数值光圈 (NA),瞳孔的光化,光源的光谱和薄膜折射率.
    • 分析不同厚度的SiO2/Si薄膜.

    主要成果:

    • 测量准确性对不同预先信息参数具有可变的敏感性.
    • 薄膜折射率是最敏感的因素;1%的偏差会导致~1%的相对厚度误差.
    • 数字孔径 (NA) 的5%偏差导致相对厚度误差小于1%.

    结论:

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    • 对薄膜折射率的准确预先了解对于精确的CSI厚度测量至关重要.
    • 了解因子灵敏度可以优化半导体制造中的CSI方法.
    • 模拟和实验结果显示出良好的协议,验证了发现.