在芯片上集成无色金属阵列
Yao Zhang1, Xiong Jiang1, Geyang Qu1
1Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Harbin Institute of Technology Shenzhen, Shenzhen, 518055, PR China.
Nature communications
|August 12, 2025
概括
研究人员开发了高效化 (Si3N4) 无色金属镜头,用于可见光. 这些金属镜头与CMOS流程兼容,可与成像芯片集成,用于紧的全彩光学成像.
科学领域:
- 光学和光子学 在光学和光子学.
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
背景情况:
- 宽带无色金属镜头对于紧,高性能光学成像至关重要.
- 使用TiO2或GaN的传统金属透镜与基于的CMOS工艺不兼容.
- 化 (Si3N4) 提供CMOS兼容性,但面临着高面积比的制造挑战.
研究的目的:
- 在可见范围内使用Si3N4.4实现高效的无色金属镜头.
- 为了展示这些金属镜头在商业成像芯片上的集成.
- 为了克服制造的局限性,并提高金属的性能.
主要方法:
- 改进了纳米制造技术,以实现Si3N4纳米结构的高面比 (~43.33).
- 制造Si3N4无色金属镜片,其数值孔径为0.155.5.
- 将制造的金属镜头与商业成像传感器集成.
主要成果:
- 由于高面比,在Si3N4纳米结构中实现了显著增加的组延迟.
- 对于Si3N4金属,其平均聚焦效率为80.39%.
- 成功集成CMOS兼容Si3N4金属透镜与成像芯片用于全彩光学成像.
结论:
- 高效的Si3N4无色金属镜头在可见范围内实现.
- 兼容CMOS的Si3N4金属透镜为芯片集成元器件铺平了道路.
- 这项工作代表了向先进的光学成像系统迈出的重要一步.
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