相关实验视频

Updated: Sep 11, 2025

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons

Published on: July 21, 2018

使用表面等离子体共振腔光刻法进行超分辨率成像

Dinghai Rui, LiBin Zhang, Huwen Ding

|August 13, 2025

概括

这项研究引入了用于超分辨率成像的表面等离子体共振腔光刻法 (SPRCL),克服了传统等离子体光刻法 (SPL) 的局限性. SPRCL实现了增强的图案均性和对比度,为先进的纳米制造提供了改进的工艺稳定性.

科学领域:

纳米光子学纳米光子学
光学石版印刷是一种光学石版印刷.
材料科学材料科学材料科学

背景情况:

表面等离子光刻法 (SPL) 使用 evanescent 波来超越衍射极限,但在稳定成像方面面临挑战.
实现高分辨率图案对于先进的微电子和光子设备制造至关重要.

研究的目的:

提出和分析一种用于超分辨率成像的新型表面等离子体共振腔光刻 (SPRCL) 技术.
调查影响SPRCL性能的因素,并与传统方法进行比较.

主要方法:

导出双共振器腔中的表面等离子极子的分散关系.
光学传递函数 (OTF) 分析以了解超分辨率机制.
使用特定波长和面具参数进行数值模拟.

主要成果:

实现的特征尺寸低至26.4nm (∼1/17波长),超过了传统的193nm沉浸式光刻.
显示的条纹分辨率低于1/11波长,具有高对比度 (>0.9) 和NILS (>1.6).
确定了影响性能的关键参数 (面罩工作周期,入射角度,电阻厚度),电阻厚度允许调节分辨率.

结论:

SPRCL提供了一种强大的超高分辨率成像方法,具有增强的图案质量.
该技术在对比度,均性和工艺稳定性方面比传统的SPL具有显著的优势.
对于下一代需要超高分辨率的纳米制造,SPRCL具有前景.

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