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Updated: Jul 17, 2026

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效率高的宽带两极化-不敏感的边缘合器在薄膜基酸平台上用于单模纤维

Shaobo Fang, Binzhou Hong, Shuyuan Liu

|August 13, 2025

概括

我们开发了一种宽带,极化不敏感的边缘合器,用于薄膜酸 (TFLN) 光子学. 该设备高效地将TFLN电路连接到标准光纤,损耗最小,对准容忍高.

科学领域:

光子学和光学工程的工程.
材料科学 (酸) 材料科学 (酸)

背景情况:

集成光子平台和光纤之间的高效接口对于可扩展的光子系统至关重要.
薄膜酸 (TFLN) 由于其电光特性,是集成光子学的一个有希望的材料,但需要有效的光纤合解决方案.

研究的目的:

为TFLN设计和优化一个宽带,极化不敏感的边缘合器 (EC).
为了在600nm的TFLN平台和1550nm的标准单模纤维之间实现高效的光合.
为了确保制造友好性和强大的对齐公差,以实现实际集成.

主要方法:

使用单层化 (Si3N4) 波导结构.
采用了三阶段的亚亚巴特缩设计,用于模式-场匹配.
模拟并优化了边缘合器几何,以实现最小的传播损失和高合效率.

主要成果:

实现了 -0.546 dB (TE) 和 -0.501 dB (TM) 的低合损失.
证明的偏振依赖损失 (PDL) 低至0.035dB.
获得了超过100nm的1dB带宽和强大的对齐公差 (TE的±2.0μm横向,±1.7μm垂直).
在TM模式中也表现出卓越的性能 (±2.2微米横向,±1.9微米垂直).

结论:

拟议的边缘合器为TFLN与光纤合提供了出色的性能指标.
它的宽带,极化不敏感性和制造友好的设计使其适合可扩展的TFLN光子集成.
实现的合效率和对齐公差对于现实应用非常有利.

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