概括
本研究引入了一种基于偏振的新型覆盖指示器,用于半导体制造. 新方法提高了覆盖计量学的准确性和稳定性,为质量控制提供了更好的工具.
科学领域:
- 半导体制造业 半导体制造业
- 光学计量学是指光学计量学.
- 石版画质量控制的质量控制
背景情况:
- 覆盖计量对于半导体光刻画质量至关重要.
- 经验衍射基覆盖 (DBO) 方法被广泛使用,但在指标选择方面面临挑战.
- 选择具有线性,灵敏性和稳健性的指标是关键的困难.
研究的目的:
- 提出一个新的覆盖指标,基于阻力穆勒矩阵的极化特态.
- 分析覆盖指示器选择的一般性质要求和优化机制.
- 为DBO指标设计提供理论基础和实际工具.
主要方法:
- 使用以圆测量为基础的计量学的新型覆盖指示器的开发.
- 对指标属性的理论分析和优化.
- 通过模拟和实验测试对双层网格目标进行验证.
主要成果:
- 与现有的穆勒矩阵指标相比,拟议的极化固态指标显示出更高的准确性和稳定性.
- 通过模拟和实验验证的有效性.
- 该方法适用于典型的双层网格覆盖层目标.
结论:
- 新的极化固态指标为覆盖计量学提供了更好的性能.
- 这项工作为设计DBO指标提供了理论基础.
- 拟议的方法代表了对工业覆盖计量实践的潜在有价值的新工具.
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