概括
我们开发了一种用于光子学的新型极化分裂格子合器 (PSGC). 这种高性能设备提供了低损耗和偏振依赖性,简化了包装使用0度纤维注入.
科学领域:
- 光子学是一种光子学.
- 集成光学 集成光学
- 纳米光子学 纳米光子学
背景情况:
- 极化分裂格器 (PSGCs) 对于光子集成电路 (PICs) 是必不可少的.
- 从光纤到PIC的两极化光线的有效合是至关重要的.
- 现有的PSGC通常在制造耐受性和性能方面面临挑战.
研究的目的:
- 通过反向设计方法提出和设计高性能PSGC.
- 在在绝缘体 (SOI) 平台上实现更高的插入损失 (IL) 和偏离依赖损失 (PDL).
- 通过单个蚀刻步骤实现高公差的制造,并降低包装成本.
主要方法:
- 利用逆向设计方法优化PSGC结构.
- 专注于用于设备实现的220nm在绝缘体 (SOI) 平台.
- 制造的PSGC性能的实验性表征.
主要成果:
- 在1534.7 nm时,达到1.05 dB的峰值插入损失 (IL) 和0.04 dB的偏振依赖损失 (PDL).
- 已证明的1dB带宽为IL的48nm和PDL的68nm.
- 经过验证的单制造,具有出色的制造容忍度和0度纤维注入能力.
结论:
- 拟议的PSGC代表了光子元件的重大进步.
- 该设备提供了最先进的性能,降低了制造复杂性和包装成本.
- 这种PSGC适用于需要高效的双极化光合的高级PIC应用.
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