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使用背面曝光和基于DMD的灰度光刻法制造微镜阵列.

Chien-Kai Hung, Chun-Ying Wu, Yung-Chun Lee

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    |August 13, 2025
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    概括

    本研究介绍了一种新的数字微镜装置 (DMD) 系统,用于制造无球微镜镜阵列. 倾斜的逐步方法确保精确的紫外线剂量控制,用于准确的微镜头成形.

    科学领域:

    • 光学和光子学 在光学和光子学.
    • 微型制造技术 微型制造技术
    • 材料科学 材料科学 材料科学

    背景情况:

    • 微镜头阵列是各种应用中的关键光学元件.
    • 传统的制造方法在实现精确的无球形形状和可扩展性方面面临着挑战.
    • 数字微镜设备 (DMD) 提供了无面具,高分辨率图案的潜力.

    研究的目的:

    • 开发和演示基于DMD的新型灰度紫外线 (UV) 光刻系统,用于制造无球微镜阵列.
    • 为了研究一种斜步式方法的有效性,以精确控制紫外线剂量.
    • 在透明基板上使用负色光电阻 (PR) 材料进行直接制造.

    主要方法:

    • 使用数字微镜装置 (DMD) 实现灰度紫外线暴露系统.
    • 采用斜阶段方法,在逐步曝光期间倾斜DMD阵列.
    • 使用透明基板上的背面紫外线图案,用于直接负色调PR处理.
    • 理论分析,数值建模和实验验证.

    主要成果:

    • 通过受控的紫外线剂量分配实现的无球微镜阵列配置的精确成型.
    • 高空间分辨率的图案由DMD和斜步进方法启用.

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  • 使用负色调光电阻材料成功制造了微镜阵列.
  • 提出的背面紫外线图案技术的可行性已被证明.
  • 结论:

    • 基于DMD的灰度UV光刻系统带有斜步是制造高质量的无球微镜阵列的可行方法.
    • 背面图案方法简化了制造过程,允许直接使用负色调的PR.
    • 这种技术为先进的光学元件制造提供了可扩展和精确的解决方案.