在氧化薄膜记忆装置中的模拟电阻切换现象
Karimul Islam1, Rezwana Sultana1, Robert Mroczyński1
1Warsaw University of Technology, Institute of Microelectronics and Optoelectronics, Koszykowa 75, 00-662 Warsaw, Poland.
Materials (Basel, Switzerland)
|August 14, 2025
概括
这项研究展示了氧化记忆器中稳定的,非挥发性的模拟电阻切换,非常适合神经形态计算中的人工突触. 这些设备具有出色的耐久性和突触可塑性,对于大脑启发的计算应用至关重要.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 计算机科学 计算机科学
背景情况:
- 由于它们的电阻开关特性,memristors对于先进的计算至关重要.
- 模拟电阻切换是模仿神经形态系统中生物突触的关键.
研究的目的:
- 在Al/TiOx/TiN/Si记忆器件中演示非挥发式模拟电阻开关.
- 调查TiOx厚度对设备性能的影响,并了解传导机制.
主要方法:
- 对TiOx沉积进行脉冲直流反应磁铁喷射.
- 电气特性包括电流-电压 (I-V) 分析.
- 对电荷传导机制的分析 (欧米,肖特基辐射,SCLC).
主要成果:
- 稳定,无成形的模拟电阻切换,耐用性 >300 个周期.
- 证明了长期强化 (LTP) 和长期抑郁 (LTD) 的特性.
- 鉴定了传导机制的变化,随着TiOx厚度 (31-44 nm) 的增加.
结论:
- 基于TiOx的记忆器表现出卓越的稳定性 (>1500秒) 和突触行为.
- 在TiOx/TiN接口上的氧空位调制驱动了模拟切换.
- 这些设备非常适合用于神经形态计算中的人工突触应用.
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