关于无形HfO中氧空缺缺陷的统计:一个神经网络原子间潜力辅助高通量预测
Shuqi Tang1, Kang Wang1, Menglin Huang1
1College of Integrated Circuits and Micro-Nano Electronics, and Key Laboratory of Computational Physical Sciences (MOE), Fudan University, Shanghai, 200433, China.
Small methods
|August 18, 2025
概括
预测无形材料中的缺陷特性是一项挑战. 本研究引入了一个图形神经网络潜力,用于准确计算无形氧氧氧氧化物中缺陷的缺陷,建立可靠超级细胞建模的标准.
科学领域:
- 材料科学 材料科学 材料科学
- 计算材料科学科学 计算材料科学
- 固态物理 固态物理
背景情况:
- 准确预测无形材料缺陷特性对于开发功能性设备至关重要,但仍然是一个重大挑战.
- 氧气空缺 (Vo) 是影响无形氧化 (a-HfO2) 性能的关键缺陷.
研究的目的:
- 开发一种高精度和计算效率的方法,用于预测无形材料的缺陷特性.
- 建立可靠的标准,用于使用超级细胞模型在统计预测点缺陷属性.
主要方法:
- 开发一个图形神经网络的原子间潜力训练在广泛的密度函数理论 (DFT) 数据对a-HfO2及其氧空缺缺陷的数据.
- 利用超级细胞模型开发的潜力,在广泛的超级细胞大小中进行中性Vo缺陷的高通量计算.
- 分析超级细胞大小对Vo形成能量的统计分布和准确性的影响.
主要成果:
- 实现了大约1meV原子-1的高能精度,用于缺陷计算.
- 证明小型超级细胞 (<1000个原子) 在统计分布中引入了显著的错误.
- 确定收计算需要高达1500个原子的超级细胞,或者选择,从多个小超级细胞 (例如30 x 96原子超级细胞) 平均结果.
结论:
- 开发的图形神经网络潜力使得DFT级准确且具有成本效益的预测能够准确地预测无形材料中的缺陷特性.
- 建立了选择适当超级细胞大小或平均策略的定量标准,以确保缺陷属性预测的准确性.
- 提供了对无形氧氧氧化物中氧空缺缺陷的明确统计理解,为改进材料设计铺平了道路.
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