在区域选择性原子层沉积中前体混合性的作用
Alexander Shearer1, Yukio Cho1,2, Andreas Werbrouck1
1Department of Chemical Engineering, Stanford University, Stanford, CA, 94305, USA.
Advanced materials (Deerfield Beach, Fla.)
|August 20, 2025
概括
甲基异氧化物 (DMAI) 能够对Al2O3进行高度选择性的区域选择性原子层沉积 (AS-ALD). 其他前体由于抑制剂层的混合性问题而失败,影响核化.
科学领域:
- 材料科学
- 纳米技术
- 化学工程
背景情况:
- 区域选择性原子层沉积 (AS-ALD) 对于先进的纳米结构制造至关重要.
- 前体选择是决定AS-ALD过程成功的一个关键因素.
- 了解抑制剂-前体相互作用是实现选择性沉积在图案表面的关键.
研究的目的:
- 研究不同前体在实现Al2O3区域选择性ALD中的作用.
- 评估乙醇 (BT) 作为铜和氧化铜表面的抑制剂的有效性.
- 了解前体结构,抑制剂相互作用和沉积选择性之间的关系.
主要方法:
- 测试了四种前体:二甲异氧化物 (DMAI),三甲 (TMA),三甲 (TEA) 和三甲 (TIBA).
- 使用乙醇 (BT) 作为Cu/CuOx特征的SiO2基板上的抑制剂.
- 在前体暴露后分析了Al2O3沉积的选择性和抑制剂层的形态.
主要成果:
- 对于介电表面的Al2O3沉积,DMAI显示出异常的选择性 (> 99.9%).
- 由于CuBT多层的混合性和降解,基前体 (TMA,TEA,TIBA) 的选择性较差.
- DMAI的选择性归因于它与CuBT层的不混合性,使其能够精确地转移图案.
结论:
- 前体配体结构显著影响与抑制剂层 (CuBT) 的混合性,影响Al2O3核化.
- DMAI是Al2O3的高选择性AS-ALD的前体,具有出色的模式传输能力.
- 这项研究通过考虑前体-抑制剂相互作用,为设计有效的AS-ALD过程提供了关键的见解.
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