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Updated: Sep 10, 2025

Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution
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Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

Published on: March 20, 2019

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特定吸附的碳酸和铜表面重建:通过时间分辨率总频生成光谱揭示的双层充电效应

Jaclyn A Rebstock1, Aishwarya Rao2, Anshuman Samanta1

  • 1Department of Chemistry and Biochemistry, The Ohio State University, Columbus, Ohio 43210, United States.

Journal of the American Chemical Society
|August 27, 2025
PubMed
概括

在CO2降解过程中,特定的离子吸附不会阻断铜电极上的CO. 相反,铜氧化和表面重建发生在毫秒的时间尺度上,影响CO脱氧和C2+选择性.

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