在投影石墨工具中的热控制系统:全面的审查
Di Cao1, He Dong2, Zhibo Zeng1
1State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China.
Micromachines
|August 28, 2025
概括
本综述探讨了先进深紫外线 (DUV) 和极紫外线 (EUV) 光刻的热控制系统. 它分析了在这些关键半导体制造工具中保持曝光精度的热挑战和解决方案.
科学领域:
- 半导体制造业
- 光学工程
- 热管理
背景情况:
- 最先进的深紫外线 (DUV) 和极紫外线 (EUV) 投影光刻仪对于半导体制造至关重要.
- 这些系统包括光源,阶段,光学和计量等关键子系统.
- 热干扰显著降低了热稳定性和均性,损害了曝光精度.
研究的目的:
- 对 DUV 和 EUV 石版工具的热控制系统设计进行审查.
- 系统地分析每个光刻子系统中的热挑战.
- 综合现有的热控制策略,并讨论未来的进展.
主要方法:
- 在DUV和EUV光刻中对热控制系统进行系统审查.
- 包括光源,阶段,光学和计量学在内的各个子系统的热挑战分析.
- 将热控制解决方案分类为结构和算法.
主要成果:
- 在高功率照射下易受热降解的关键子系统.
- 合成了已建立的热控制结构和算法来应对这些挑战.
- 强调热稳定性和梯度均性对曝光精度的影响.
结论:
- 有效的热控制对于保持高精度的高级光刻技术至关重要.
- 所有子系统都需要采用系统化的热管理方法.
- 未来的热控制系统的进步对于下一代光刻工具至关重要.
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