在非生物压力下对Solanum nigrum的参考基因进行全面验证:识别用于除草剂耐药性的pendimethalin响应基因

Wen Chen1, Yufei Zhao2, Xu Yang2

  • 1College of Agriculture, Tarim University, Alaer 843300, China; Key Laboratory of Genetic Improvement and Efficient Production for Specialty, Crops in Arid Southern Xinjiang of Xinjiang Corps, Alaer 843300, China; Key Laboratory of Integrated Pest Management of Xinjiang Production and Construction Corps in Southern Xinjiang, Alaer 843300, China; State Key Laboratory of Cotton Bio-breeding and Integrated Utilization, Anyang, 455000, China.

概括

这项研究确定了在各种压力下使黑夜 (Solanum nigrum L.) 的基因表达正常化的最佳基因. 这些验证的基因对于理解杂草适应除草剂和其他环境挑战至关重要.